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Large gap quantum spin Hall insulator, massless Dirac fermions and bilayer graphene analogue in InAs/Ga(In)Sb heterostructures

机译:大间隙量子自旋霍尔绝缘体,无质量Dirac费米子和   Inas / Ga(In)sb异质结构中的双层石墨烯类似物

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摘要

The quantum spin Hall insulator (QSHI) state has been demonstrated in twosemiconductor systems - HgTe/CdTe quantum wells (QWs) and InAs/GaSb QWbilayers. Unlike the HgTe/CdTe QWs, the inverted band gap in InAs/GaSb QWbilayers does not open at the $\Gamma$ point of the Brillouin zone, preventingthe realization of massless Dirac fermions. Here, we propose a new class ofsemiconductor systems based on InAs/Ga(In)Sb multilayers, hosting a QSHI state,a graphene-like phase and a bilayer graphene analogue, depending on their layerthicknesses and geometry. The QSHI gap in the novel structures can reach up to60 meV for realistic design and parameters. This value is twice as high as thethermal energy at room temperature and significantly extends the applicationpotential of III-V semiconductor-based topological devices.
机译:在两个半导体系统-HgTe / CdTe量子阱(QW)和InAs / GaSb QW双层中证明了量子自旋霍尔绝缘体(QSHI)的状态。与HgTe / CdTe QW不同,InAs / GaSb QW双层中的倒带隙在布里渊区的\γ点不打开,从而阻止了无质量狄拉克费米子的实现。在这里,我们提出了一种基于InAs / Ga(In)Sb多层的新型半导体系统,取决于它们的层厚和几何形状,其具有QSHI状态,类石墨烯相和双层石墨烯类似物。新颖的结构中的QSHI间隙可以达到60 meV,以实现逼真的设计和参数。该值是室温下的热能的两倍,并且极大地扩展了基于III-V半导体的拓扑器件的应用潜力。

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